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To cite or link to this reference: http://hdl.handle.net/10068/257965
Title :

Development of tips for the scanning probe lithography Final report

Entwicklung von Spitzen fuer die Raster-Sonden-Lithographie Schlussbericht
Author :
Ohlsson, O. ;
Corporate author :
NANOSENSORS Dr. Olaf Wolter GmbH, Wetzlar (Germany) ;
Publication year :
1996
Language :
German ;
Abstract :
State of the art lithography techniques use UV-photons and optical masks achieving approx. 200 nm ground rules. Besides e-beam direct writing SXM methods have been pursued in research for nanostructuring. The aim of this project is to develop force sensors (cantilevers with integrated tips) using silicon technology for the application in a Scanning Probe Lithography tool. The tip of the AFM sensor acts as the source for low energy electrons for the exposure of specially developed (Siemens: 13 N 6226) two layer resists. The optimum exposure voltage of 50 V generates strong electrostatic forces. Therefore a cantilever with integrated shielding electrode has been developed. Additionally an alignment chip has been developed which allows a reproducible exchange of the AFM sensor without readjustment of the optical detection system. (orig.) ;
Pagination/Size :
19 p. ;
SIGLE classification :
20K - Solid-state physics ;
Keyword(s) :
CANTILEVER ; TIP ; FORCE SENSOR ; PROBE ; SCANNING FORCE MICROSCOPY ; AFM ; SFM ; SXM ; LITHOGRAPHY ;
Document type :
I - Miscellaneous ;
Gov't Doc # :
BMBF 13N6325 ;
Other identifier :
DE_ 1998:2041 ; DE ;
handle :
http://hdl.handle.net/10068/257965
Sponsor :
Bundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany) ;
Provenance :
SIGLE ;
Get a copy :
FIZ - Fachinformationszzentrum Karlsruhe TIB - Technische Informationsbibliothek
Availability :
Available from TIB Hannover: F98B6+a
Country :
Germany ;